1. Electron beam performance: Acceleration voltage ranges from 0.02kV to 30kV, with a resolution of 0.6nm at 15kV. It delivers outstanding low-voltage imaging performance for all types of high-precision microscopic observation. 2. Dual-beam configuration: The electron beam provides high-resolution imaging, while the ion beam performs precise micro-nano etching, cutting and deposition, enabling in-situ observation and fabrication in one system. 3. Sample compatibility: Variable pressure mode is available to handle challenging specimens unsuitable for high-vacuum observation, such as non-conductive, magnetic, water/oil-containing and outgassing samples. 4. Operational advantages: Equipped with intelligent workflow, it supports automatic TEM lamella preparation and 3D slice reconstruction, ideal for high-throughput sample preparation and analysis. 5. Expandability: Modular design allows integration with various detectors to meet extended requirements including in-situ experiments and micro-nano structure characterization.
PRODUCT CENTER
PRODUCT CENTER
Field Emission Scanning Electron Microscope (FE-SEM)
Integrated dual-beam microscopy platform integrating GEMINI electron beam imaging and Ion-sculptor focused ion beam processing. It features high-resolution imaging, micro-nano fabrication and 3D analysis, easy to operate and suitable for shared laboratories of various scenarios.
产品用途
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产品详情
- 基础参数
1. Micro-nano defect repair, cross-section slicing, fine structure characterization and failure analysis for semiconductors and microelectronic devices. 2. Micro-nano fabrication, interface structure observation and precise composition analysis of new materials, thin films and coatings. 3. Non-destructive imaging and micro-precision processing of complex samples such as biomaterials, polymers and ceramics, supporting 3D structural reconstruction analysis.
Sanhao Instruments
A reliable testing instrument manufacturer, feel free to contact us anytime.